SiC materials - Progress, status, and potential roadblocks

被引:166
作者
Powell, AR [1 ]
Rowland, LB
机构
[1] Cree Inc, Durham, NC 27703 USA
[2] GE Co, Corp Res & Dev, Nishayuna, NY 12309 USA
关键词
blue light-emitting diodes (LEDs); high power switching; hot-wall epitaxy; physical vapor transport; SiC substrates; vapor phase epitaxy;
D O I
10.1109/JPROC.2002.1021560
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
SiC materials are currently metamorphosing from research and development into a market driven manufacturing product. SiC substrates are currently used as the base for a large fraction of the world production of green, blue, and ultraviolet light-emitting diodes (LEDs). Emerging markets for SiC homoepitaxy include high-power switching devices and microwave devices for S and X band. Applications for heteroepitaxial GaN-based structures on SiC substrates include LEDs and microwave devices. In this paper we review the properties of SiC, assess the current status of substrate and epitaxial growth, and outline our expectations for SiC in the future.
引用
收藏
页码:942 / 955
页数:14
相关论文
共 87 条
[1]  
Augustine G, 1997, PHYS STATUS SOLIDI B, V202, P137, DOI 10.1002/1521-3951(199707)202:1<137::AID-PSSB137>3.0.CO
[2]  
2-Y
[3]   GROWTH OF LARGE SIC SINGLE-CRYSTALS [J].
BARRETT, DL ;
MCHUGH, JP ;
HOBGOOD, HM ;
HOPKINS, RH ;
HOPKINS, RH ;
MCMULLIN, PG ;
CLARKE, RC ;
CHOYKE, WJ .
JOURNAL OF CRYSTAL GROWTH, 1993, 128 (1-4) :358-362
[4]   THERMAL-CONDUCTIVITY AND ELECTRICAL-PROPERTIES OF 6H SILICON-CARBIDE [J].
BURGEMEISTER, EA ;
VONMUENCH, W ;
PETTENPAUL, E .
JOURNAL OF APPLIED PHYSICS, 1979, 50 (09) :5790-5794
[5]   SiC epitaxial layer growth in a novel multi-wafer vapor-phase epitaxial (VPE) reactor [J].
Burk, AA ;
O'Loughlin, MJ ;
Nordby, HD .
JOURNAL OF CRYSTAL GROWTH, 1999, 200 (3-4) :458-466
[6]  
Burk AA, 1997, PHYS STATUS SOLIDI B, V202, P263, DOI 10.1002/1521-3951(199707)202:1<263::AID-PSSB263>3.0.CO
[7]  
2-Y
[8]   The role of excess silicon and in situ etching on 4H-SiC and 6H-SiC epitaxial layer morphology [J].
Burk, AA ;
Rowland, LB .
JOURNAL OF CRYSTAL GROWTH, 1996, 167 (3-4) :586-595
[9]  
Burk AA, 1996, APPL PHYS LETT, V68, P382, DOI 10.1063/1.116692
[10]   HETEROEPITAXIAL GROWTH OF BETA-SIC FILMS ON TIC SUBSTRATES - INTERFACE STRUCTURES AND DEFECTS [J].
CHIEN, FR ;
NUTT, SR ;
CARULLI, JM ;
BUCHAN, N ;
BEETZ, CP ;
YOO, WS .
JOURNAL OF MATERIALS RESEARCH, 1994, 9 (08) :2086-2095