Unintentional conductivity of indium nitride: transport modelling and microscopic origins

被引:37
作者
King, P. D. C. [1 ]
Veal, T. D. [1 ]
McConville, C. F. [1 ]
机构
[1] Univ Warwick, Dept Phys, Coventry CV4 7AL, W Midlands, England
基金
英国工程与自然科学研究理事会;
关键词
FUNDAMENTAL-BAND GAP; ELECTRON ACCUMULATION; SYNCHROTRON-RADIATION; TERAHERTZ EMISSION; HEXAGONAL INN; POLAR INN; NONPOLAR; GROWTH; SEMICONDUCTORS; ABSORPTION;
D O I
10.1088/0953-8984/21/17/174201
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
A three-region model for the high n-type conductivity in InN, including contributions from the bulk, surface and buffer layer interface of the sample, is considered. In particular, a parallel conduction analysis is used to show that this model can account for the carrier concentration and mobility variation with film thickness that has previously been determined from single-field Hall effect measurements. Microscopic origins for the donors in each region are considered, and the overriding tendency towards n-type conductivity is discussed in terms of the bulk band structure of InN.
引用
收藏
页数:7
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