In situ reflectance difference spectroscopy of ZnSe-based semiconductor surfaces

We will give a brief report on applications of reflectance difference spectroscopy (RDS) for in situ growth monitoring during MOVPE. The experiments were made on GaAs(001) substrates using dimethylzinc-triethylamine, ditbutylselenide and as metalorganic precursors in a laminar flow reactor. We analyzed the influence of the in situ GaAs-substrate preparation on the optical response of the surface. The growth of ZnSe was investigated and compared to data obtained in an MBE process. Spectra at various stages of growth and time-dependent kinetic RDS records were measured during deposition and fitted with a three-layer growth model. Furthermore we utilized the surface sensitivity of the RDS technique to demonstrate surface kinetic processes during p-doping with tbutylamine.