A way to higher resolution: spherical-aberration correction in a 200 kV transmission electron microscope

被引：37

作者：

Urban, K ^{[1
]}

Kabius, B

Haider, M

Rose, H

机构：

[1] Forschungszentrum, Inst Festkorperforsch, D-52425 Julich, Germany

[2] CEOS GmbH, D-69120 Heidelberg, Germany

[3] Rhein Westfal TH Aachen, Inst Angew Phys, D-64289 Darmstadt, Germany

来源：

JOURNAL OF ELECTRON MICROSCOPY | 1999年 / 48卷 / 06期

关键词：

transmission electron microscopy; spherical aberration; spherical-aberration correction; structure images; contrast delocalization;

D O I：

10.1093/oxfordjournals.jmicro.a023753

中图分类号：

TH742 [显微镜];

学科分类号：

摘要：

A double hexapole corrector system was constructed for compensation of the spherical aberration of the objective lens of a transmission electron microscope. By implementing this system on a commercial 200 kV instrument with a field emission gun, the spherical aberration correction was demonstrated and an improvement of the point resolution from 0.24 to 0.13 nm was realized. Applying the new instrument to structure studies on Si/CoSi2 interfaces it was demonstrated that an outstanding additional advantage of aberration correction is the substantially reduced contrast delocalization in high-resolution images.

引用

页码：821 / 826

页数：6

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