Size influence on the propagation loss induced by sidewall roughness in ultrasmall SOI waveguides

被引:151
作者
Grillot, F [1 ]
Vivien, L [1 ]
Laval, S [1 ]
Pascal, D [1 ]
Cassan, E [1 ]
机构
[1] Univ Paris 11, Inst Elect Fondamentale, F-91405 Orsay, France
关键词
optical interconnects; optical telecommunications; optical waveguide; propagation loss; roughness; silicon-on-insulator (SOI);
D O I
10.1109/LPT.2004.828497
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Silicon-on-insulator (SOI) optical waveguides with high electromagnetic field confinement suffer from sidewall roughness which is responsible for strong scattering effects. This letter reports a numerical investigation on the size influence of ultrasmall SOI waveguides on the propagation loss due to sidewall roughness. It is shown that for a size smaller than 260 x 260 nm the roughness-induced propagation loss decreases. As the optical mode confinement is reduced, a very low loss light coupling from and to a single-mode fiber can be achieved with propagation loss as low as 0.5 dB/cm for a 150 x 150 nm cross-sectional waveguide.
引用
收藏
页码:1661 / 1663
页数:3
相关论文
共 13 条
[1]   Scattering at sidewall roughness in photonic crystal slabs [J].
Bogaerts, W ;
Bienstman, P ;
Baets, R .
OPTICS LETTERS, 2003, 28 (09) :689-691
[2]  
IVIEN L, 2003, J LIGHTWAVE TECHNOL, V21, P2429
[3]   Roughness, inhomogeneity, and integrated optics [J].
Ladouceur, F .
JOURNAL OF LIGHTWAVE TECHNOLOGY, 1997, 15 (06) :1020-1025
[4]   EFFECT OF SIDE WALL ROUGHNESS IN BURIED-CHANNEL WAVE-GUIDES [J].
LADOUCEUR, F ;
LOVE, JD ;
SENDEN, TJ .
IEE PROCEEDINGS-OPTOELECTRONICS, 1994, 141 (04) :242-248
[5]   MEASUREMENT OF SURFACE-ROUGHNESS IN BURIED CHANNEL WAVE-GUIDES [J].
LADOUCEUR, F ;
LOVE, JD ;
SENDEN, TJ .
ELECTRONICS LETTERS, 1992, 28 (14) :1321-1322
[6]   Low-loss optical waveguide on standard SOI/SIMOX substrate [J].
Layadi, A ;
Vonsovici, A ;
Orobtchouk, R ;
Pascal, D ;
Koster, A .
OPTICS COMMUNICATIONS, 1998, 146 (1-6) :31-33
[7]   Effect of size and roughness on light transmission in a Si/SiO2 waveguide:: Experiments and model [J].
Lee, KK ;
Lim, DR ;
Luan, HC ;
Agarwal, A ;
Foresi, J ;
Kimerling, LC .
APPLIED PHYSICS LETTERS, 2000, 77 (11) :1617-1619
[8]   Fabrication of ultralow-loss Si/SiO2 waveguides by roughness reduction [J].
Lee, KK ;
Lim, DR ;
Kimerling, LC ;
Shin, J ;
Cerrina, F .
OPTICS LETTERS, 2001, 26 (23) :1888-1890
[9]   A THEORETICAL-ANALYSIS OF SCATTERING LOSS FROM PLANAR OPTICAL WAVE-GUIDES [J].
PAYNE, FP ;
LACEY, JPR .
OPTICAL AND QUANTUM ELECTRONICS, 1994, 26 (10) :977-986
[10]   LOW-LOSS SINGLEMODE OPTICAL WAVE-GUIDES WITH LARGE CROSS-SECTION IN SILICON-ON-INSULATOR [J].
SCHMIDTCHEN, J ;
SPLETT, A ;
SCHUPPERT, B ;
PETERMANN, K ;
BURBACH, G .
ELECTRONICS LETTERS, 1991, 27 (16) :1486-1488