Low-loss optical waveguide on standard SOI/SIMOX substrate

被引：39

作者：

Layadi, A ^{[1
]}

Vonsovici, A ^{[1
]}

Orobtchouk, R ^{[1
]}

Pascal, D ^{[1
]}

Koster, A ^{[1
]}

机构：

[1] Univ Paris Sud, CNRS URA 22, Inst Elect Fondamentale, F-91405 Orsay, France

来源：

OPTICS COMMUNICATIONS | 1998年 / 146卷 / 1-6期

关键词：

SIMOX; waveguide; propagation loss; surface passivation;

D O I：

10.1016/S0030-4018(97)00600-7

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

Propagation loss measurements are reported for silicon waveguides formed by the thin silicon film of standard SIMOX substrate. Values very close to the theoretical limit associated with leakage towards the substrate are obtained when a high quality interface between the silicon film and the passivation layer is achieved. (C) 1998 Elsevier Science B.V.

引用

页码：31 / 33

页数：3

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