Density and temperature in an inductively amplified magnetron discharge for titanium deposition

被引:57
作者
Ricard, A
Nouvellon, C
Konstantinidis, S
Dauchot, JP
Wautelet, M
Hecq, M
机构
[1] Univ Mons, Lab Chim Inorgan & Analyt, Mat Nova, B-7000 Mons, Belgium
[2] Univ Toulouse 3, Ctr Phys Plasmas & Applicat Toulouse, F-31062 Toulouse, France
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 2002年 / 20卷 / 04期
关键词
D O I
10.1116/1.1488948
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
In order to determine the titanium neutral density, a direct current (dc) plasma discharge, amplified by a radio-frequency (rf) coil, was studied by absorption spectrometry. The argon pressure varied from 5 to 40 mTorr. The dc and rf powers varied between 100 and 1500 W and 0 and 500 W, respectively. The plasma gas temperature necessary for the density calculation was evaluated by analyzing the N-2 rotational spectrum in an Ar-N-2 gas mixture. When increasing the rf power a decrease of titanium neutral density was found. This decrease is related to the increased titanium ion density. When using the rf coil, the titanium degree of ionization can be up to 90%. (C) 2002 American Vacuum Society.
引用
收藏
页码:1488 / 1491
页数:4
相关论文
共 18 条
[1]   Emission characteristics of the dc, 100 kHz and 13.5 MHz hollow cathode discharges [J].
BorkowskaBurnecka, J ;
Zyrnicki, W .
SPECTROSCOPY LETTERS, 1997, 30 (04) :701-716
[2]   A spectroscopic study of DC magnetron and RF coil plasmas in ionised physical vapour deposition [J].
Christou, C ;
Chiu, KF ;
Barber, ZH .
VACUUM, 2000, 58 (2-3) :250-255
[3]   Diagnostics by optical absorption of sputtered atom density in magnetron discharges [J].
Dony, MF ;
Dauchot, JP ;
Wautelet, M ;
Hecq, M ;
Ricard, A .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 2000, 18 (03) :809-813
[4]   Study of an argon magnetron discharge used for molybdenum sputtering. II: spectroscopic analysis and comparison with the model [J].
Guimaraes, F. ;
Almeida, J. B. ;
Bretagne, J. .
PLASMA SOURCES SCIENCE & TECHNOLOGY, 1993, 2 (03) :138-144
[5]  
HOCHARD L, 1994, ESCAMPIG E, V18, P336
[6]   LANGMUIR PROBE AND OPTICAL-EMISSION SPECTROSCOPIC STUDIES OF AR AND O-2 PLASMAS [J].
HOPE, DAO ;
COX, TI ;
DESHMUKH, VGI .
VACUUM, 1987, 37 (3-4) :275-277
[7]   Ionization enhancement in ionized magnetron sputter deposition [J].
Joo, J .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 2000, 18 (01) :23-29
[8]  
MILLER PA, 1988, J VAC SCI TECHNOL A, V16, P3240
[9]  
Mitchell A. G., 1971, RESONANCE RAD EXCITE
[10]   KINETIC REACTIONS INVOLVING THE TITANIUM ATOMS IN AN ARGON TITANIUM HOLLOW-CATHODE AFTERGLOW [J].
OHEBSIAN, D ;
SADEGHI, N ;
TRASSY, C ;
MERMET, JM .
OPTICS COMMUNICATIONS, 1980, 32 (01) :81-86