Study of an argon magnetron discharge used for molybdenum sputtering. II: spectroscopic analysis and comparison with the model

被引:23
作者
Guimaraes, F. [1 ]
Almeida, J. B. [1 ]
Bretagne, J. [2 ]
机构
[1] Univ Minho, Fis Lab, P-4719 Braga, Codex, Portugal
[2] Univ Paris 11, CNRS, Phys Gaz & Plasmas Lab, UA 0073, F-91405 Orsay, France
关键词
D O I
10.1088/0963-0252/2/3/002
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
By optical emission spectroscopy the spectra of an argon magnetron discharge working with a molybdenum cathode was studied and quantitatively compared with the results of a kinetic model of the discharge. Some Arl 5p -> 4s transitions have been particularly used for this comparison. The behaviour of their intensities as functions of the discharge current and gas pressure was found to be in good agreement with the model. The intense MO lines emitted by the plasma are used, with help of the model, to determine MO atom densities in the plasma. The effect of the thermalization of MO atoms by the gas is discussed.
引用
收藏
页码:138 / 144
页数:7
相关论文
共 15 条
[1]  
BRETAGNE J, 1992, EUR C F, V16
[2]   SPECTROSCOPIC DIAGNOSTICS OF CF4-O2 PLASMAS DURING SI AND SIO2 ETCHING PROCESSES [J].
DAGOSTINO, R ;
CRAMAROSSA, F ;
DEBENEDICTIS, S ;
FERRARO, G .
JOURNAL OF APPLIED PHYSICS, 1981, 52 (03) :1259-1265
[3]   ANISOTROPIC ETCHING OF SIO2 IN LOW-FREQUENCY CF4/O2 AND NF3/AR PLASMAS [J].
DONNELLY, VM ;
FLAMM, DL ;
DAUTREMONTSMITH, WC ;
WERDER, DJ .
JOURNAL OF APPLIED PHYSICS, 1984, 55 (01) :242-252
[4]   MODELING OF THE ENERGY DEPOSITION MECHANISMS IN AN ARGON MAGNETRON PLANAR DISCHARGE [J].
GUIMARAES, F ;
ALMEIDA, J ;
BRETAGNE, J .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1991, 9 (01) :133-140
[5]  
GUIMARAES F, 1990, NATO ADV SCI I E-APP, V176, P535
[6]   Study of an argon magnetron discharge used for molybdenum sputtering. I: collisional radiative model [J].
Guimaraes, F. ;
Bretagne, J. .
PLASMA SOURCES SCIENCE & TECHNOLOGY, 1993, 2 (03) :127-137
[7]   FULL-PLANE THRESHOLD ENERGIES FOR CATHODE SPUTTERING OF METALS WITH AR+ IONS [J].
HENSCHKE, EB ;
DERBY, SE .
JOURNAL OF APPLIED PHYSICS, 1963, 34 (08) :2458-&
[8]   DIAGNOSTICS BY OPTICAL-EMISSION SPECTROSCOPY IN THE VICINITY OF THE SUBSTRATE DURING MAGNETRON SPUTTERING OF TI [J].
PECH, T ;
CHABRERIE, JP ;
RICARD, A .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1988, 6 (05) :2987-2991
[9]   GAS-DENSITY REDUCTION EFFECTS IN MAGNETRONS [J].
ROSSNAGEL, SM .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1988, 6 (01) :19-24
[10]  
ROSSNAGEL SM, 1988, IEEE T PLASMA SCI, V18, P878