共 20 条
[2]
THE USE OF NITROGEN FLOW AS A DEPOSITION RATE CONTROL IN REACTIVE SPUTTERING
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS,
1986, 4 (03)
:594-597
[3]
Chapman B., 1980, GLOW DISCHARGE PROCE
[7]
OPTICAL SPECTROSCOPY FOR DIAGNOSTICS AND PROCESS-CONTROL DURING GLOW-DISCHARGE ETCHING AND SPUTTER DEPOSITION
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY,
1978, 15 (05)
:1718-1729
[9]
SPATIAL DEPENDENCE OF THE OPTICAL-EMISSION INTENSITIES FROM CF4+O2 PLASMAS
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B,
1986, 4 (01)
:6-9
[10]
DEVELOPMENTS IN IONIZATION ASSISTED PROCESSES
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS,
1985, 3 (06)
:2354-2363