THE USE OF NITROGEN FLOW AS A DEPOSITION RATE CONTROL IN REACTIVE SPUTTERING

[1] STOICHIOMETRY DETERMINATION OF REACTIVELY SPUTTERED TITANIUM-SILICIDE [J]. VACUUM, 1982, 32 (10-1) : 665 - 667

[2] BLOM HO, 1986, THIN SOLID FILMS, V130, P307

[3] GERAGHTY KG, 1976, J ELECTROCHEM SOC, V123, P141

[4] GLOW-DISCHARGE OPTICAL SPECTROSCOPY FOR MONITORING SPUTTER DEPOSITED FILM THICKNESS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1973, 10 (06): : 1144 - 1149

[5] PARTIAL-PRESSURE CONTROL OF REACTIVELY SPUTTERED TITANIUM NITRIDE [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1985, 3 (03): : 592 - 595

[6] INFLUENCE OF THE NITROGEN PARTIAL-PRESSURE ON THE PROPERTIES OF DC-SPUTTERED TITANIUM AND TITANIUM NITRIDE FILMS [J]. THIN SOLID FILMS, 1984, 111 (04) : 339 - 349

[7] VOLTAGE-CONTROLLED, REACTIVE PLANAR MAGNETRON SPUTTERING OF AIN THIN-FILMS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 20 (03): : 376 - 378

[8] MECHANISMS OF REACTIVE SPUTTERING OF INDIUM .1. GROWTH OF INN IN MIXED AR-N2 DISCHARGES [J]. THIN SOLID FILMS, 1980, 69 (02) : 201 - 216

[9] REACTIVE MAGNETRON SPUTTERING OF TITANIUM AND ITS OXIDES [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 20 (04): : 1389 - 1392

[10] OSTLING S, 1984, J VAC SCI TECHNOL A, V2, P281

[1] STOICHIOMETRY DETERMINATION OF REACTIVELY SPUTTERED TITANIUM-SILICIDE [J]. VACUUM, 1982, 32 (10-1) : 665 - 667

[2] BLOM HO, 1986, THIN SOLID FILMS, V130, P307

[3] GERAGHTY KG, 1976, J ELECTROCHEM SOC, V123, P141

[4] GLOW-DISCHARGE OPTICAL SPECTROSCOPY FOR MONITORING SPUTTER DEPOSITED FILM THICKNESS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1973, 10 (06): : 1144 - 1149

[5] PARTIAL-PRESSURE CONTROL OF REACTIVELY SPUTTERED TITANIUM NITRIDE [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1985, 3 (03): : 592 - 595

[6] INFLUENCE OF THE NITROGEN PARTIAL-PRESSURE ON THE PROPERTIES OF DC-SPUTTERED TITANIUM AND TITANIUM NITRIDE FILMS [J]. THIN SOLID FILMS, 1984, 111 (04) : 339 - 349

[7] VOLTAGE-CONTROLLED, REACTIVE PLANAR MAGNETRON SPUTTERING OF AIN THIN-FILMS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 20 (03): : 376 - 378

[8] MECHANISMS OF REACTIVE SPUTTERING OF INDIUM .1. GROWTH OF INN IN MIXED AR-N2 DISCHARGES [J]. THIN SOLID FILMS, 1980, 69 (02) : 201 - 216

[9] REACTIVE MAGNETRON SPUTTERING OF TITANIUM AND ITS OXIDES [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 20 (04): : 1389 - 1392

[10] OSTLING S, 1984, J VAC SCI TECHNOL A, V2, P281