REACTIVE MAGNETRON SPUTTERING OF TITANIUM AND ITS OXIDES

被引：8

作者：

NYAIESH, AR

HOLLAND, L

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1982年 / 20卷 / 04期

关键词：

D O I：

10.1116/1.571613

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：1389 / 1392

页数：4

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[1] TUNNEL MAGNETRON CHARACTERISTICS AND DISCHARGE DIAGNOSTICS
HOLLAND, L
[J]. THIN SOLID FILMS, 1981, 86 (2-3) : 227 - 239
[2] THE EFFECTS OF GAS-COMPOSITION ON DISCHARGE AND DEPOSITION CHARACTERISTICS WHEN MAGNETRON SPUTTERING ALUMINUM
NYAIESH, AR
HOLLAND, L
[J]. VACUUM, 1981, 31 (8-9) : 371 - 375
[3] THE DEPENDENCE OF DEPOSITION RATE ON POWER INPUT FOR DC AND RF MAGNETRON SPUTTERING
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HOLLAND, L
[J]. VACUUM, 1981, 31 (07) : 315 - 317
[4] THE CHARACTERISTICS OF A PLANAR MAGNETRON OPERATED AT A HIGH-POWER INPUT
NYAIESH, AR
[J]. THIN SOLID FILMS, 1981, 86 (2-3) : 267 - 277
[5] NYAIESH AR, VACUUM