共 20 条
- [1] MEASUREMENT OF PLASMA DISCHARGE CHARACTERISTICS FOR SPUTTERING APPLICATIONS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (02): : 199 - 202
- [3] THE REDUCTION OF AG2S AND TREATMENT OF PAPER IN A MAGNETRON GLOW-DISCHARGE [J]. SURFACE TECHNOLOGY, 1981, 14 (03): : 205 - 218
- [4] THE OXIDATION OF COLLOIDAL CARBON IN A PLANAR MAGNETRON AR-O-2 GLOW-DISCHARGE [J]. SURFACE TECHNOLOGY, 1980, 11 (06): : 403 - 410
- [5] Holland L, 1980, I PHYS C SER, V54, P220
- [6] HOLLAND L, 1956, VACUUM DEPOSITION TH, P429
- [8] Knauer W., 1965, U.S. patent, Patent No. [3,216,652, 3216652]
- [10] DISCHARGE CHARACTERISTICS FOR MAGNETRON SPUTTERING OF AL IN AR AND AR-O-2 MIXTURES [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1980, 17 (03): : 743 - 751