共 20 条
- [1] MEASUREMENT OF PLASMA DISCHARGE CHARACTERISTICS FOR SPUTTERING APPLICATIONS[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (02): : 199 - 202ESER, EOGILVIE, RETAYLOR, KA
- [2] SUBSTRATE FLOATING POTENTIAL CHARACTERISTICS IN PLANAR MAGNETRON AND HT SPUTTERING SYSTEMS[J]. VACUUM, 1980, 30 (07) : 267 - 274HOLLAND, LSAMUEL, G
- [3] THE REDUCTION OF AG2S AND TREATMENT OF PAPER IN A MAGNETRON GLOW-DISCHARGE[J]. SURFACE TECHNOLOGY, 1981, 14 (03): : 205 - 218HOLLAND, LSAMUEL, G
- [4] THE OXIDATION OF COLLOIDAL CARBON IN A PLANAR MAGNETRON AR-O-2 GLOW-DISCHARGE[J]. SURFACE TECHNOLOGY, 1980, 11 (06): : 403 - 410HOLLAND, LSAMUEL, G
- [5] Holland L, 1980, I PHYS C SER, V54, P220
- [6] HOLLAND L, 1956, VACUUM DEPOSITION TH, P429
- [7] SPUTTERING PROCESS MODEL OF DEPOSITION RATE[J]. IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1979, 23 (01) : 24 - 32KELLER, JHSIMMONS, RG
- [8] Knauer W., 1965, U.S. patent, Patent No. [3,216,652, 3216652]
- [9] LANGMUIR PROBE MEASUREMENTS IN NEGATIVE GLOW OF A SPUTTERING DC DISCHARGE[J]. JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1978, 11 (03) : 293 - 300LEMPERIERE, GPOITEVIN, JMFOURRIER, C
- [10] DISCHARGE CHARACTERISTICS FOR MAGNETRON SPUTTERING OF AL IN AR AND AR-O-2 MIXTURES[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1980, 17 (03): : 743 - 751MANIV, SWESTWOOD, WD