THE EFFECTS OF GAS-COMPOSITION ON DISCHARGE AND DEPOSITION CHARACTERISTICS WHEN MAGNETRON SPUTTERING ALUMINUM

被引：12

作者：

NYAIESH, AR

HOLLAND, L

机构：

来源：

关键词：

D O I：

10.1016/S0042-207X(81)80045-0

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：371 / 375

页数：5

共 12 条

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[3] SUBSTRATE FLOATING POTENTIAL CHARACTERISTICS IN PLANAR MAGNETRON AND HT SPUTTERING SYSTEMS
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[4] THE OXIDATION OF COLLOIDAL CARBON IN A PLANAR MAGNETRON AR-O-2 GLOW-DISCHARGE
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SAMUEL, G
[J]. SURFACE TECHNOLOGY, 1980, 11 (06): : 403 - 410
[5] GETTER SPUTTERING - REVIEW
HOLLAND, L
COX, REL
[J]. VACUUM, 1974, 24 (03) : 107 - 116
[6] HOLLAND L, 1981, UNPUB THIN SOLID FIL
[7] HOLLAND L, 1974, VACUUM MANUAL, P376
[8] HOLLAND L, 1956, VACUUM DEPOSITION TH, P429
[9] DISCHARGE CHARACTERISTICS FOR MAGNETRON SPUTTERING OF AL IN AR AND AR-O-2 MIXTURES
MANIV, S
WESTWOOD, WD
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1980, 17 (03): : 743 - 751
[10] THE DEPENDENCE OF DEPOSITION RATE ON POWER INPUT FOR DC AND RF MAGNETRON SPUTTERING
NYAIESH, AR
HOLLAND, L
[J]. VACUUM, 1981, 31 (07) : 315 - 317