HIGH-RATE SPUTTER DEPOSITION - CIRCULAR MAGNETRONS

被引:9
作者
FRASER, DB
机构
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1978年 / 15卷 / 02期
关键词
D O I
10.1116/1.569449
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:178 / 178
页数:1
相关论文
共 7 条
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    FRASER, DB
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    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (02): : 179 - 187
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    WILSON, RW
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    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1976, 13 (01): : 157 - 164