AN OPTICAL-EMISSION STUDY OF THE GLOW-DISCHARGE DEPOSITION OF HYDROGENATED AMORPHOUS-SILICON FROM ARGON-SILANE MIXTURES

被引：54

作者：

KAMPAS, FJ

机构：

来源：

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D O I：

10.1063/1.332382

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：2276 / 2280

页数：5

共 22 条

[1] BELL AT, 1974, TECHNIQUES APPLICATI, P34
[2] BELL AT, 1974, TECHNIQUES APPLICATI, P31
[3] CALVERT JG, 1966, PHOTOCHEMISTRY, P60
[4] OPTICAL-EMISSION SPECTROSCOPY OF REACTIVE PLASMAS - A METHOD FOR CORRELATING EMISSION INTENSITIES TO REACTIVE PARTICLE DENSITY
COBURN, JW
CHEN, M
[J]. JOURNAL OF APPLIED PHYSICS, 1980, 51 (06) : 3134 - 3136
[5] The far ultraviolet spectra of methylsilanes
Harada, Y.
Murrell, J. N.
Sheena, H. H.
[J]. CHEMICAL PHYSICS LETTERS, 1968, 1 (12) : 595 - 596
[6] HERZBERG G, 1950, MOL SPECTRA MOL STRU, V1, P410
[7] HUBER KP, 1979, MOL SPECTRA MOL STRU, V4, P242
[8] ARRHENIUS PARAMETERS FOR SILENE INSERTION REACTIONS
JOHN, P
PURNELL, JH
[J]. JOURNAL OF THE CHEMICAL SOCIETY-FARADAY TRANSACTIONS I, 1973, 69 (08): : 1455 - 1461
[9] HYDROGEN ELIMINATION DURING THE GLOW-DISCHARGE DEPOSITION OF A-SI-H ALLOYS
KAMPAS, FJ
GRIFFITH, RW
[J]. APPLIED PHYSICS LETTERS, 1981, 39 (05) : 407 - 409
[10] ORIGIN OF EMITTING SPECIES IN THE PLASMA DEPOSITION OF A-SI-H ALLOYS
KAMPAS, FJ
GRIFFITH, RW
[J]. JOURNAL OF APPLIED PHYSICS, 1981, 52 (03) : 1285 - 1288