Scanning differential. spreading resistance microscopy on actively driven buried heterostructure multiquantum-well lasers

被引:8
作者
Ban, D
Sargent, EH
Dixon-Warren, SJ
机构
[1] Univ Toronto, Dept Elect & Comp Engn, Toronto, ON M5S 3G4, Canada
[2] Natl Res Council Canada, Inst Microstruct Sci, Ottawa, ON K1A 0R6, Canada
[3] Chipworks, Ottawa, ON K2H 5B7, Canada
关键词
atomic force microscopy; electron overbarrier leakage; multiquantum-well (MQW) lasers; scanning differential spreading resistance microscopy (SDSRM); scanning voltage microscopy; semiconductor lasers;
D O I
10.1109/JQE.2004.830174
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We have developed a new scanning probe microscopy-based technique, scanning differential spreading resistance microscopy (SDSRM), which enables the determination of free carrier distribution inside operating electronic and optoelectronic devices. The results of our SDSRM study of multi-quantum-well (MQW) buried heterostructure (BH) lasers under zero and forward biases are reported. Individual QW-barrier layers can be resolved in high-resolution SDSRM. The SDSRM results show different internal carrier distribution within the MQW active region in BH lasers with and without biases and provide direct experimental evidence of electron overbarrier leakage. Our results demonstrate the utility of SDSRM to delineate quantitatively the transverse cross-sectional structure of complex two-dimensional devices such as MQW BH lasers under operating conditions, in which traditional probing such as secondary ion mass spectroscopy, scanning spreading resistance microscopy, and electron beam-induced current microscopy can either apply only to devices under zero bias or provide only qualitative pictures.
引用
收藏
页码:865 / 870
页数:6
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