Nanosecond electron microscopes

被引：47

作者：

Bostanjoglo, O ^{[1
]}

Elschner, R ^{[1
]}

Mao, Z ^{[1
]}

Nink, T ^{[1
]}

Weingärtner, M ^{[1
]}

机构：

[1] Tech Univ Berlin, Inst Opt, D-10623 Berlin, Germany

来源：

ULTRAMICROSCOPY | 2000年 / 81卷 / 3-4期

关键词：

high-speed transmission and photoelectron microscopes; deformations and melt instabilities after ns and fs laser pulses;

D O I：

10.1016/S0304-3991(99)00180-1

中图分类号：

TH742 [显微镜];

学科分类号：

摘要：

Combining electron optics, fast electronics and pulsed lasers, a transmission and a photoelectron emission microscope were built, which visualize events in thin films and on surfaces with a time resolution of several nanoseconds. The high-speed electron microscopy is capable to track fast laser-induced processes in metals below the ablation threshold, which are difficult to detect by other imaging techniques. The material response to nano- and femtosecond laser pulses was found to be very different. It was dominated by thermo/chemocapillary flow and chemical reactions in the case of nanosecond pulses, and by mechanical deformations and non-thermal electron emission after a femtosecond pulse. (C) 2000 Elsevier Science B.V. All rights reserved.

引用

页码：141 / 147

页数：7

共 18 条

[11] KrF-excimer laser-induced native oxide removal from Si(100) surfaces studied by Auger electron spectroscopy [J].