Pulsed photoelectron microscope for time-resolved surface investigations

被引：6

作者：

Weingartner, M ^{[1
]}

Bostanjoglo, O ^{[1
]}

机构：

[1] Tech Univ Berlin, Inst Opt, D-10623 Berlin, Germany

来源：

SURFACE & COATINGS TECHNOLOGY | 1998年 / 100卷 / 1-3期

关键词：

photoelectron microscope; time resolution;

D O I：

10.1016/S0257-8972(97)00593-8

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

A new photoelectron emission microscope with a time/space resolution of 5 ns/1 mu m is presented. Short-exposure imaging is done by releasing the photoelectrons with an excimer laser pulse. It is a sensitive probe for surface parameters, in particular the local work function, and allows their fast changes to be visualised. The instrument is used to investigate metal foils and evaporated metal films on bulk substrates, treated with a pulsed, frequency-doubled Nd:YAG laser. Local removal of oxide layers and adsorbates, and trapping of electrons by electronegative impurities in molten metals are traced on a nanosecond time scale. (C) 1998 Elsevier Science S.A.

引用

页码：85 / 89

页数：5

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[2]

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[4] A UHV-COMPATIBLE PHOTOELECTRON EMISSION MICROSCOPE FOR APPLICATIONS IN SURFACE SCIENCE [J].

ENGEL, W ;

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[5]

GRIFFITH OH, 1991, ULTRAMICROSCOPY, V36, P262, DOI 10.1016/0304-3991(91)90155-Y

[6]

GRIFFITH OH, 1987, ADV OPTICAL ELECTRON, V10, P269

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