High peak-to-valley current ratio GaInAs/GaInP resonant tunneling diodes

被引:3
作者
Oobo, T [1 ]
Takemura, R [1 ]
Suhara, M [1 ]
Miyamoto, Y [1 ]
Furuya, K [1 ]
机构
[1] TOKYO INST TECHNOL,RES CTR QUANTUM EFFECT ELECT,MEGURO KU,TOKYO 152,JAPAN
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1997年 / 36卷 / 08期
关键词
resonant tunneling diodes; GaInAs/GaInP; OMVPE; strained layer;
D O I
10.1143/JJAP.36.5079
中图分类号
O59 [应用物理学];
学科分类号
摘要
As an Al-free material system, the GaInAs/GaInP heterostructure has a large conduction-band discontinuity. We,report the fabrication of GaInAs/GaInP resonant tunneling diodes which exhibit current density-voltage characteristics with a peak-to-valley current ratio of 7.8 at 4.2K. To our knowledge, this is the highest value obtained for this material system.
引用
收藏
页码:5079 / 5080
页数:2
相关论文
共 6 条
[1]  
BEAM EA, 1992, MATER RES SOC SYMP P, V240, P33
[2]   RELATIONSHIP BETWEEN THE CONDUCTION-BAND DISCONTINUITIES AND BAND-GAP DIFFERENCES OF INGAASP/INP HETEROJUNCTIONS [J].
FORREST, SR ;
SCHMIDT, PH ;
WILSON, RB ;
KAPLAN, ML .
APPLIED PHYSICS LETTERS, 1984, 45 (11) :1199-1201
[3]  
*IEICE, 1993, HDB MAT ADV DEV, P156
[4]  
NAGAI H, 1988, 3 5 MIXED CRYSTALS
[5]  
REAVES CM, 1994, MATER RES SOC SYMP P, V340, P147, DOI 10.1557/PROC-340-147
[6]   HIGH P/V RATIO OF GAINAS INP RESONANT TUNNELING DIODE GROWN BY OMVPE [J].
SEKIGUCHI, T ;
MIYAMOTO, Y ;
FURUYA, K .
JOURNAL OF CRYSTAL GROWTH, 1992, 124 (1-4) :807-811