Polymer brush resist for responsive wettability

被引：46

作者：

Brown, Andrew A. ^{[1
]}

Azzaroni, Omar ^{[1
,2
]}

Fidalgo, Luis M. ^{[1
]}

Huck, Wilhelm T. S. ^{[1
]}

机构：

[1] Univ Cambridge, Dept Chem, Melville Lab Polymer Synth, Cambridge CB2 1EW, England

[2] Natl Univ La Plata, INIFTA, CONICET, RA-1900 La Plata, Argentina

来源：

SOFT MATTER | 2009年 / 5卷 / 14期

基金：

英国工程与自然科学研究理事会;

关键词：

TRANSFER RADICAL POLYMERIZATION; PHOTOCHEMICAL ACID GENERATION; CHEMICAL AMPLIFICATION; BUTYL METHACRYLATE; CONTROLLED GROWTH; BLOCK-COPOLYMERS; SURFACES; KINETICS;

D O I：

10.1039/b902179e

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Well-defined polymer films which change their wettability in response to external stimuli are extensively used within the microelectronics industry, and are rapidly becoming equally beneficial in the field of microfluidics and lab-on-a-chip technologies. The fabrication of a self-contained polymer brush resist, by using the chemistry of surface initiated atom transfer radical polymerization (SI-ATRP) and photoacid generators (PAGs), and its subsequent responsive wettability will be the subject of this paper. Since UV light is used to trigger the responsive behaviour, spatially addressable patterning could be achieved, without the use of sacrificial layers, allowing for the formation of single films with regions of different wettabilities.

引用

页码：2738 / 2745

页数：8

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