Thickness dependence of the optical properties of sputter deposited Ti oxide films

被引：122

作者：

Rodríguez, J ^{[1
]}

Gómez, M ^{[1
]}

Ederth, J ^{[1
]}

Niklasson, GA ^{[1
]}

Granqvist, CG ^{[1
]}

机构：

[1] Uppsala Univ, Dept Mat Sci, Angstrom Lab, SE-75121 Uppsala, Sweden

来源：

THIN SOLID FILMS | 2000年 / 365卷 / 01期

关键词：

optical coatings; optical properties; sputtering; titanium oxide;

D O I：

10.1016/S0040-6090(99)01109-8

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Amorphous and crystalline Ti oxide films were obtained by reactive magnetron sputtering onto substrates at different temperatures. Optical constants of the films were determined from spectrophotometric measurements of reflectance and transmittance. The amorphous films had a band gap of similar to 3.4 eV and a wide absorption tail extending to lower energies. The crystalline films displayed a band gap of 3.3-3.35 eV and a more narrow absorption tail. The optical constants were dependent on film thickness. The crystalline films showed evidence of structural inhomogeneities leading to diffuse scattering in the thicker films as well as to a grading of the refractive index. (C) 2000 Elsevier Science S.A. All rights reserved.

引用

页码：119 / 125

页数：7

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