Valence band hybridization in N-rich GaN1-xAsx alloys -: art. no. 115214

被引:83
作者
Wu, J [1 ]
Walukiewicz, W
Yu, KM
Denlinger, JD
Shan, W
Ager, JW
Kimura, A
Tang, HF
Kuech, TF
机构
[1] Univ Calif Berkeley, Lawrence Berkeley Lab, Div Mat Sci, Berkeley, CA 94720 USA
[2] Univ Calif Berkeley, Lawrence Berkeley Lab, Advance Light Source, Berkeley, CA 94720 USA
[3] Univ Wisconsin, Dept Chem & Biol Engn, Madison, WI 53706 USA
关键词
D O I
10.1103/PhysRevB.70.115214
中图分类号
T [工业技术];
学科分类号
08 [工学];
摘要
We have used photomodulated transmission and optical absorption spectroscopies to measure the composition dependence of interband optical transitions in N-rich GaN1-xAsx alloys with x up to 0.06. The direct band gap gradually decreases as x increases. In the dilute x limit, the observed band gap approaches 2.8 eV; this limiting value is attributed to a transition between the As localized level, which has been previously observed in As-doped GaN at 0.6 eV above the valence band maximum in As-doped GaN, and the conduction band minimum. The structure of the valence band of GaN1-xAsx is explained by the hybridization of the localized As states with the extended valence band states of GaN matrix. The hybridization is directly confirmed by soft x-ray emission experiments. To describe the electronic structure of the GaN1-xAsx alloys in the entire composition range a linear interpolation is used to combine the effects of valence band hybridization in N-rich alloys with conduction band anticrossing in As-rich alloys.
引用
收藏
页码:115214 / 1
页数:7
相关论文
共 26 条
[1]
Current status of research and development of III-N-V semiconductor alloys [J].
Ager, JW ;
Walukiewicz, W .
SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 2002, 17 (08) :741-745
[2]
ASPNES DE, 1980, OPTICAL PROPERTIES S, pCHA4
[3]
Density of states, hybridization, and band-gap evolution in AlxGa1-xN alloys [J].
Duda, LC ;
Stagarescu, CB ;
Downes, J ;
Smith, KE ;
Korakakis, D ;
Moustakas, TD ;
Guo, JH ;
Nordgren, J .
PHYSICAL REVIEW B, 1998, 58 (04) :1928-1933
[4]
GaN-rich side of GaNAs grown by gas source molecular beam epitaxy [J].
Iwata, K ;
Asahi, H ;
Asami, K ;
Kuroiwa, R ;
Gonda, S .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 1998, 37 (3B) :1436-1439
[5]
Growth of GaNAs alloys on the N-rich side with high As content by metalorganic vapor phase epitaxy [J].
Kimura, A ;
Tang, HF ;
Kuech, TF .
JOURNAL OF CRYSTAL GROWTH, 2004, 265 (1-2) :71-77
[6]
Epitaxial GaN1-yAsy layers with high As content grown by metalorganic vapor phase epitaxy and their band gap energy [J].
Kimura, A ;
Paulson, CA ;
Tang, HF ;
Kuech, TF .
APPLIED PHYSICS LETTERS, 2004, 84 (09) :1489-1491
[7]
Martin G, 1996, APPL PHYS LETT, V68, P2541, DOI 10.1063/1.116177
[8]
Deep electronic gap levels induced by isovalent P and As impurities in GaN [J].
Mattila, T ;
Zunger, A .
PHYSICAL REVIEW B, 1998, 58 (03) :1367-1373
[9]
SURFACE RECOMBINATION, FREE-CARRIER SATURATION, AND DANGLING BONDS IN INP AND GAAS [J].
NOLTE, DD .
SOLID-STATE ELECTRONICS, 1990, 33 (02) :295-298
[10]
The transition from As-doped GaN, showing blue emission, to GaNAs alloys in films grown by molecular beam epitaxy [J].
Novikov, SV ;
Winser, AJ ;
Bell, A ;
Harrison, I ;
Li, T ;
Campion, RP ;
Staddon, CR ;
Davis, CS ;
Ponce, FA ;
Foxon, CT .
JOURNAL OF CRYSTAL GROWTH, 2002, 240 (3-4) :423-430