Temperature dependent study of the microwave performance of 0.25-mu m gate GaAs MESFET's and GaAs pseudomorphic HEMT's

被引:23
作者
Feng, M
Scherrer, DR
Apostolakis, PJ
Kruse, JW
机构
[1] Dept. of Elec. and Comp. Engineering, Ctr. Compd. Semiconduct. M., University of Illinois, Urhana, IL
关键词
D O I
10.1109/16.502115
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We report on the noise figure, associated gain, and the current gain cutoff frequency for comparable 0.25-mu m gate GaAs MESFET's and GaAs pseudomorphic HEMT's (p-HEMT's) as a function of cryogenic temperature, Contrary to previously published results which suggest that p-HEMT's should have a higher electron velocity and a lower noise figure than MESFET's due to the effects of the two-dimension electron gas (2-DEG), we have experimentally verified that this is not the case, We show clear evidence that the transport properties of the 2-DEG in p-HEMT's do not make a significant contribution to the speed enhancement and noise reduction during high-frequency operation of these devices, It is the fundamental InGaAs material properties, specifically the Gamma-L valley separation in the conduction band and associated effective mass of the electron in either GaAs or InGaAs channel, which limits the high-field electron velocity and thus the speed and noise performance of the devices.
引用
收藏
页码:852 / 860
页数:9
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