Fabrication of Antireflective Sub-Wavelength Structures on Silicon Nitride Using Nano Cluster Mask for Solar Cell Application

被引：44

作者：

Sahoo, Kartika Chandra ^{[1
]}

Lin, Men-Ku ^{[2
]}

Chang, Edward-Yi ^{[1
]}

Lu, Yi-Yao ^{[1
]}

Chen, Chun-Chi ^{[1
]}

Huang, Jin-Hua ^{[2
]}

Chang, Chun-Wei ^{[3
]}

机构：

[1] Natl Chiao Tung Univ, Dept Mat Sci & Engn, Hsinchu, Taiwan

[2] Natl Tsing Hua Univ, Dept Mat Sci & Engn, Hsinchu, Taiwan

[3] Taiwan Semicond Mfg Co Ltd, Hsinchu, Taiwan

来源：

NANOSCALE RESEARCH LETTERS | 2009年 / 4卷 / 07期

关键词：

Sub-wavelength Structure; Solar cell; SWS fabrication; Reflectance; Anti-reflective coatings; COATINGS; LAYER; DESIGN; FILMS;

D O I：

10.1007/s11671-009-9297-7

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

We have developed a simple and scalable approach for fabricating sub-wavelength structures (SWS) on silicon nitride by means of self-assembled nickel nanoparticle masks and inductively coupled plasma (ICP) ion etching. Silicon nitride SWS surfaces with diameter of 160-200 nm and a height of 140-150 nm were obtained. A low reflectivity below 1% was observed over wavelength from 590 to 680 nm. Using the measured reflectivity data in PC1D, the solar cell characteristics has been compared for single layer anti-reflection (SLAR) coatings and SWS and a 0.8% improvement in efficiency has been seen.

引用

页码：680 / 683

页数：4

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