Real-time shape evolution of nanoimprinted polymer structures during thermal annealing

被引：71

作者：

Jones, Ronald L. ^{[1
]}

Hu, Tengjiao

Soles, Christopher L.

Lin, Eric K.

Reano, Ronald M.

Casa, Diego M.

机构：

[1] Natl Inst Stand & Technol, Div Polymers, Gaithersburg, MD 20899 USA

[2] Univ Michigan, Dept Elect Engn & Comp Sci, Ann Arbor, MI 48109 USA

[3] Argonne Natl Lab, CMC, CAT, Adv Photon Source, Argonne, IL 60439 USA

来源：

NANO LETTERS | 2006年 / 6卷 / 08期

关键词：

D O I：

10.1021/nl061086i

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

The real-time shape evolution of nanoimprinted polymer patterns is measured as a function of annealing time and temperature using critical dimension small-angle X-ray scattering (CD-SAXS). Periodicity, line width, line height, and sidewall angle are reported with nanometer resolution for parallel line/space patterns in poly(methyl methacrylate) (PMMA) both below and above the bulk glass transition temperature (T-G). Heating these patterns below T-G does not produce significant thermal expansion, at least to within the resolution of the measurement. However, above T-G the fast rate of loss in pattern size at early times transitions to a reduced rate in longer time regimes. The time-dependent rate of polymer flow from the pattern into the underlying layer, termed pattern "melting", is consistent with a model of elastic recovery from stresses induced by the molding process.

引用

页码：1723 / 1728

页数：6

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