N-Doped Titania Thin Films Prepared by Atmospheric Pressure CVD using t-Butylamine as the Nitrogen Source: Enhanced Photocatalytic Activity under Visible Light

被引：31

作者：

Dunnill, Charles. W. ^{[1
]}

Parkin, Ivan. P. ^{[1
]}

机构：

[1] UCL, Dept Chem, Ctr Mat Res, London WC1H 0AJ, England

来源：

CHEMICAL VAPOR DEPOSITION | 2009年 / 15卷 / 7-9期

基金：

英国工程与自然科学研究理事会;

关键词：

CHEMICAL-VAPOR-DEPOSITION; SEMICONDUCTOR PHOTOCATALYSIS; GLASS; TIO2; DIOXIDE; ORIENTATION; COATINGS; NITRIDE; NH3;

D O I：

10.1002/cvde.200806274

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

N-TiO2 prepared by atmospheric pressure chemical vapour deposition shows visible light photocatalysis. This is to our knowledge the first example of an N-doped anatase film with only interstitial doping. The film was prepared using a method that is entirely compatible with industrial processes for producing self-cleaning glass.

引用

页码：171 / +

页数：5

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