Growth and characterization of indium oxide thin films prepared by spray pyrolysis

被引:49
作者
Manoj, P. K. [1 ]
Gopchandran, K. G.
Koshy, Peter
Vaidyan, V. K.
Joseph, Benny
机构
[1] Univ Kerala, Dept Phys, Trivandrum 695581, Kerala, India
[2] CSIR, Reg Res Lab, Trivandrum 695019, Kerala, India
[3] St Josephs Coll, Dept Phys, Calicut 673008, Kerala, India
关键词
indium oxide; chemical deposition; optical constants;
D O I
10.1016/j.optmat.2005.08.012
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Highly transparent and conducting indium oxide thin films are prepared on glass substrates from precursor solution of indium. chloride. These films are characterized by X-ray diffraction, scanning electron microscopy and optical transmission. The preferential orientation of these films is found to be sensitive to deposition parameters. A comparative study has been made on the dependence on the thickness of the film on substrate temperatures with aqueous solution and 1:1 C2H5OH and H2O as precursors. Films deposited at optimum conditions have 167 nm thickness and exhibited a resistivity of 2.94 x 10(-4) ohm in along with transmittance better than 82% at 550 nm. The analytical expressions enabling the derivation of the optical constants of these films from their transmission spectrum only have successfully been applied. Finally, the refractive index dispersion is discussed in terms of the single-oscillator Wemple and Didomenico model. (c) 2005 Elsevier B.V. All rights reserved.
引用
收藏
页码:1405 / 1411
页数:7
相关论文
共 21 条
[1]   Structural, electrical and optical studies on chemically deposited tin oxide films from inorganic precursors [J].
Amma, DSD ;
Vaidyan, VK ;
Manoj, PK .
MATERIALS CHEMISTRY AND PHYSICS, 2005, 93 (01) :194-201
[2]   Retrieval of optical constants and thickness of thin films from transmission spectra [J].
Chambouleyron, I ;
Martinez, JM ;
Moretti, AC ;
Mulato, M .
APPLIED OPTICS, 1997, 36 (31) :8238-8247
[3]   Antireflective coating for ITO films deposited on glass substrate [J].
Chiou, BS ;
Tsai, JH .
JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS, 1999, 10 (07) :491-495
[4]  
Culity BD, 1978, Elements of X-ray diffraction, V2nd
[5]   FORMATION AND CHARACTERIZATION OF GRAIN-ORIENTED VO2 THIN-FILMS [J].
DENATALE, JF ;
HOOD, PJ ;
HARKER, AB .
JOURNAL OF APPLIED PHYSICS, 1989, 66 (12) :5844-5850
[6]  
ECKERTOVA L, 1986, PHYS TIN FILMS
[7]  
ENOLE J, 1986, SOC ELECTROCHEM SCI, V133, P1583
[8]   INVESTIGATION OF BURIED HOMOJUNCTIONS IN P-INP FORMED DURING SPUTTER DEPOSITION OF BOTH INDIUM TIN OXIDE AND INDIUM OXIDE [J].
GESSERT, TA ;
LI, X ;
WANLASS, MW ;
NELSON, AJ ;
COUTTS, TJ .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1990, 8 (03) :1912-1916
[9]   The preparation of transparent electrically conducting indium oxide films by reactive vacuum evaporation [J].
Gopchandran, KG ;
Joseph, B ;
Abraham, JT ;
Koshy, P ;
Vaidyan, VK .
VACUUM, 1997, 48 (06) :547-550
[10]  
GOWSAMI B, 1996, THIN FILM FUNDAMENTA