Tensile testing of AlCu thin films on polyimide foils

被引:87
作者
Macionczyk, F [1 ]
Brückner, W [1 ]
机构
[1] Inst Solid State & Mat Res Dresden, D-01171 Dresden, Germany
关键词
D O I
10.1063/1.371461
中图分类号
O59 [应用物理学];
学科分类号
摘要
Mechanical properties of sputtered AlCu(0.5 wt %) thin films, 0.2-2.0 mu m thick, were determined by tensile testing. For comparison, tensile tests were also performed on bulk samples of the same composition. The films were deposited on thin polyimide foils. They were characterized with respect to the surface, microstructure, residual stress, and concentration of copper and oxygen. Stress-strain curves of the films were obtained by separating the force working on the polyimide foil from that working on the metal-polyimide compound. Young's modulus of the films almost corresponded to the bulk value. Films with a thickness > 1.5 mu m broke by formation of macrocracks while thinner films showed formation of microcracks. The Hall-Petch model, additional strengthening by small grain size, and the role of grain boundary sliding for crack formation are discussed. (C) 1999 American Institute of Physics. [S0021- 8979(99)07121-2].
引用
收藏
页码:4922 / 4929
页数:8
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