Polymer screening method for chemically amplified electron beam and X-ray resists

被引：67

作者：

Yamamoto, H ^{[1
]}

Nakano, A ^{[1
]}

Okamoto, K ^{[1
]}

Kozawa, T ^{[1
]}

Tagawa, S ^{[1
]}

机构：

[1] Osaka Univ, Inst Sci & Ind Res, Ibaraki, Osaka 5670047, Japan

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 2004年 / 43卷 / 6B期

关键词：

electron beam lithography; chemically amplified resist; acid; base polymer; onium salt; Coumarin; 6;

D O I：

10.1143/JJAP.43.3971

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

In the acid generation processes of chemically amplified electron beam and X-ray resists, protons come from not acid generators but base polymers. This means that the selection of base polymers has a great effect on the acid generation efficiency. In this article we describe a convenient method of screening polymers for acid generation. We also showed the difference in acid generation efficiencies among substituted polystyrenes.

引用

页码：3971 / 3973

页数：3

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