Aluminum single electron transistors with islands isolated from the substrate

被引:42
作者
Krupenin, VA [1 ]
Presnov, DE
Zorin, AB
Niemeyer, J
机构
[1] Moscow MV Lomonosov State Univ, Cryoelect Lab, Moscow 119899, Russia
[2] PTB, D-38116 Braunschweig, Germany
[3] Moscow MV Lomonosov State Univ, Inst Nucl Phys, Moscow 119899, Russia
关键词
D O I
10.1023/A:1004625530034
中图分类号
O59 [应用物理学];
学科分类号
摘要
The low-frequency noise figures of single-electron transistors (electrometers) of traditional planar and new stacked geometry were compared. We observed a correlation between the charge noise and the contact area of the transistor island with a dielectric substrate in the set of Al transistors located on the same chip and having almost similar electric parameters. We have found that the smaller the contact area the lower the noise level of the transistor. The lowest noise value (delta Q(x) = (8 +/- 2) x 10(-6) e/root Hz at 10Hz) has been measured in a stacked transistor with an island which was completely isolated from a substrate. Our measurements have unambiguously indicated that the dominant source of the background charge fluctuations is associated with a dielectric substrate.
引用
收藏
页码:287 / 296
页数:10
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