Anomalous capture and emission from internal surfaces of semiconductor voids: Nanopores in SiC

被引:15
作者
Look, DC [1 ]
Fang, ZQ
Soloviev, S
Sudarshan, TS
Boeckl, JJ
机构
[1] Wright State Univ, Semicond Res Ctr, Dayton, OH 45435 USA
[2] Univ S Carolina, Dept Elect Engn, Columbia, SC 29208 USA
[3] USAF, Res Lab, Mat & Mfg Directorate, Wright Patterson AFB, OH 45433 USA
关键词
D O I
10.1103/PhysRevB.69.195205
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Deep level transient spectroscopy in nanoporous, n-type SiC reveals a new type of deep (similar to0.8 eV) trap that can hold more than 100 electrons and that has anomalous capture and emission behavior. Here we quantitatively explain these effects with a new, general formalism that treats both emission and capture in the presence of dynamic energy barriers, resulting from the charging and discharging of states on the internal surfaces of voids, such as pores or nanopipes. The capture kinetics display a logarithmic time dependence over a certain filling range, as has often been observed in connection with dislocation-related trapping.
引用
收藏
页码:195205 / 1
页数:4
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