Progress in development of 3-aspherical mirror optics for EUVL

被引：10

作者：

Kinoshita, H ^{[1
]}

Watanabe, T ^{[1
]}

Bajuk, D ^{[1
]}

Daniel, J ^{[1
]}

Kimpara, Y ^{[1
]}

Kriese, M ^{[1
]}

Platonov, Y ^{[1
]}

机构：

[1] Himeji Inst Technol, Sci & Technol Lab, Himeji, Hyogo 67122, Japan

来源：

EUV, X-RAY, AND NEUTRON OPTICS AND SOURCES | 1999年 / 3767卷

关键词：

lithography; multilayer; aspherical mirror; extreme ultraviolet;

D O I：

10.1117/12.371114

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

A three-aspherical mirror system for extreme ultraviolet lithography (EUVL) has been developed. The mirrors were fabricated using a computer-controlled optical surfacing (CCOS) process and a phase-shift interferometer. The figure error of the mirrors is 0.58 nm. To achieve a high reflectivity in the clear aperture, Mo/Si multilayer films with an optimized d-spacing were successfully deposited on the mirrors. These results show that we have nearly achieved the target specifications for EUVL mirrors.

引用

页码：164 / 171

页数：8

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