Positron beams: The journey from fundamental physics to industrial application

被引:8
作者
Coleman, PG [1 ]
机构
[1] Univ Bath, Dept Phys, Bath BA2 7AY, Avon, England
基金
英国工程与自然科学研究理事会;
关键词
positron beams; vacancies; semiconductor defects;
D O I
10.1016/S0168-583X(02)00710-3
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
Monoenergetic beams of positrons developed for fundamental atomic physics experiments have evolved - via basic and applied research in condensed matter physics and chemistry - to a phase in which possibilities for commercial exploitation are becoming apparent. The evolution of positron beam technology, from table-top laboratory-based apparatus with positrons of energies controllable in the 10(0)-10(2) eV energy range and beam intensities of similar to1 s(-1), to systems capable of delivering positrons of energies from 0.02 eV to MeV at intensities as high as 10(8) s(-1), has been both steady and saltatory. The journey from fundamental research to industrial application is a classic example of scientific development; a brief summary of steps on the way is followed by an example in which an attempt is being made to harness the efficacy of positron beams applied to defect spectroscopy of semiconductor structures to create an instrument of value to the ion implantation industry. (C) 2002 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:83 / 89
页数:7
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