Applications of infrared absorption spectroscopy to the microelectronics industry

被引：16

作者：

Chabal, YJ ^{[1
]}

Raghavachari, K ^{[1
]}

机构：

[1] Agere Syst, Mat Res, Murray Hill, NJ 07974 USA

来源：

SURFACE SCIENCE | 2002年 / 502卷

关键词：

infrared absorption spectroscopy; etching; oxidation; silicon;

D O I：

10.1016/S0039-6028(01)01896-9

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

A review is presented of infrared absorption studies that are closely linked to the issues of silicon processing important for the microelectronics community. In particular, we focus attention on the contributions of infrared studies to wet chemical processing (HF etching) and silicon surface passivation (oxidation).

引用

收藏

页码：41 / 50

页数：10

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