Effects of Ar pressure on ion flux energy distribution and ion fraction in r.f.-plasma-assisted magnetron sputtering

被引：19

作者：

Kusano, E ^{[1
]}

Fukushima, K ^{[1
]}

Saitoh, T ^{[1
]}

Saiki, S ^{[1
]}

Kikuchi, N ^{[1
]}

Nanto, H ^{[1
]}

Kinbara, A ^{[1
]}

机构：

[1] Kanazawa Inst Technol, AMS R&D Ctr, Yatsukaho, Matto 9240838, Japan

来源：

SURFACE & COATINGS TECHNOLOGY | 1999年 / 120卷

关键词：

energy distribution analysis; ionized PVD; sputtering; titanium;

D O I：

10.1016/S0257-8972(99)00453-3

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

In r.f.-plasma-assisted sputtering, the ion fraction of the sputtered metal is thought to be enhanced by increasing Ar pressure. In this study, effects of Ar pressure on ion energy distribution and ion fraction of the metal flux have been investigated. The experiments have been performed by using a 55 mm diameter Ti magnetron cathode and a 60 mm diameter copper r.f. coil. The ion energy distribution of the depositing flux was measured by an energy-resolved mass spectrometer. The experimental results show that the number of Ti-divided by ions increases with Ar pressure, whereas that of Ar-divided by ions decreases. The ion fraction of the Ti flux reached 80% at an Ar pressure of 4.0 Pa. The electron temperature decreased with increasing Ar pressure as a result of plasma quenching induced by the ionization of the Ti metal atoms that have a lower ionization potential. The results emphasize the strong effects of Ar pressure on the ion fraction and plasma conditions. The Penning ionization is thought to be the dominant ionization process for Ti atoms in the r.f.-plasma-assisted sputtering. (C) 1999 Elsevier Science S.A. All rights reserved.

引用

页码：189 / 193

页数：5

共 9 条

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