Non-contact fluorescence measurements for inspection and imprint depth control in nanoimprint lithography

被引：3

作者：

Finder, C ^{[1
]}

Mayer, C ^{[1
]}

Schulz, H ^{[1
]}

Scheer, HC ^{[1
]}

Fink, M ^{[1
]}

Pfeiffer, K ^{[1
]}

机构：

[1] Univ Duisburg, Inst Chem, Duisburg, Germany

来源：

18TH EUROPEAN CONFERENCE ON MASK TECHNOLOGY FOR INTEGRATED CIRCUITS AND MICROCOMPONENTS | 2002年 / 4764卷

关键词：

nanoimprint lithography (NIL); fluorescence microscopy;

D O I：

10.1117/12.479357

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Fluorescence microscopy was introduced as a low cost contamination-free method for rapid quality assessment of an imprint process. An optical microscope equipped with a UV-light source was used and the polymer for imprint was labelled with a fluorescent dye, based on perylene-tetracarboxylic acid dianhydride. The fluorescence images were compared with SEM measurements as well as profilometer data. Fluorescence microscopy was successfully applied to detect sticking of the polymer, typical flow defects like filling deficiencies and uniformity of the imprint depth.

引用

页码：218 / 223

页数：6

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