A 4.2-ps ECL ring-oscillator in a 285-GHz fMAX SiGe technology

被引:18
作者
Jagannathan, B [1 ]
Meghelli, M
Rylyakov, AV
Groves, RA
Chinthakindi, AK
Schnabel, CM
Ahlgren, DA
Freeman, GG
Stein, KJ
Subbanna, S
机构
[1] IBM Microelect, SRDC, Hopewell Jct, NY 12533 USA
[2] IBM Corp, TJ Watson Res Ctr, Yorktown Hts, NY 10598 USA
关键词
germanium; heterojunction bipolar transistors (HBTs); high-speed devices; ring oscillators; SiGe; silicon;
D O I
10.1109/LED.2002.802654
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This letter reports on the room temperature operation of a conventional SiGe bipolar ECL ring oscillator with a minimum stage delay of 4.2 ps for similar to250 mV single ended voltage swing. To our knowledge, this is the lowest reported delay for a gate fabricated using transistor devices. The circuit uses 0.12 x 2 mum(2) emitter size SiGe n-p-n transistors with a room temperature f(T) of 207 GHz and f(MAX) (unilateral gain extrapolation) of 285 GHz. The ring oscillator was studied as a function of various device and circuit parameters and it was found that minimum delay is more dependent on the parasitic resistance and capacitance in the n-p-n device than on pure transit time across the device.
引用
收藏
页码:541 / 543
页数:3
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