Hydrogen-induced passivation of nitrogen in GaAs1-yNy -: art. no. 235210

被引:21
作者
Bissiri, M
von Högersthal, GBH
Polimeni, A
Gaspari, V
Ranalli, F
Capizzi, M
Bonapasta, AA
Jiang, F
Stavola, M
Gollub, D
Fischer, M
Reinhardt, M
Forchel, A
机构
[1] Univ Roma La Sapienza, Ist Nazl Fis Mat, I-00185 Rome, Italy
[2] Univ Roma La Sapienza, Dipartimento Fis, I-00185 Rome, Italy
[3] Ist Chim Mat ICMAT, Area Ric Roma Montelibretti, I-00016 Monterotondo Staz Roma, Italy
[4] Lehigh Univ, Dept Phys, Bethlehem, PA 18015 USA
[5] Univ Wurzburg, D-97074 Wurzburg, Germany
来源
PHYSICAL REVIEW B | 2002年 / 65卷 / 23期
关键词
D O I
10.1103/PhysRevB.65.235210
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Nitrogen isoelectronic impurities in GaAs1-yNy are fully passivated by H irradiation from N dilute to the alloy limit. Photoluminescence measurements show that (i) for yless than or equal to0.001, exciton recombination lines in N-related complexes are fully quenched upon hydrogenation; (ii) for ygreater than or equal to0.01, the GaAs1-yNy band gap blueshifts toward that of the N-free material with increasing H dose. Thermal annealings restore the optical properties GaAs1-yNy had before hydrogenation. Finally, theoretical results on H equilibrium positions are reported and a mechanism for N passivation by H is given.
引用
收藏
页码:2352101 / 2352105
页数:5
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