Nanoscale patterning of magnetic islands by imprint lithography using a flexible mold

被引：124

作者：

McClelland, GM ^{[1
]}

Hart, MW ^{[1
]}

Rettner, CT ^{[1
]}

Best, ME ^{[1
]}

Carter, KR ^{[1
]}

Terris, BD ^{[1
]}

机构：

[1] IBM Corp, Div Res, Almaden Res Ctr, San Jose, CA 95120 USA

来源：

APPLIED PHYSICS LETTERS | 2002年 / 81卷 / 08期

关键词：

D O I：

10.1063/1.1501763

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

A nanomolding process for producing 55-nm-diameter magnetic islands over 3-cm-wide areas is described. A master pattern of SiO2 pillars is used to form a polymeric mold, which is in turn used to mold a photopolymer resist film. This latter film is used as a resist for etching SiO2, yielding a pattern of pillars. Finally, an 11-nm-CoPt multilayer is deposited. Magnetic force microscopy reveals that the film on top of each pillar is a magnetically isolated single domain that switches independently. (C) 2002 American Institute of Physics.

引用

页码：1483 / 1485

页数：3

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