Excitation of Tm3+ by resonant energy transfer from Si nanocrystals

被引:16
作者
Watanabe, K
Tamaoka, H
Fujii, M [1 ]
Hayashi, S
机构
[1] Kobe Univ, Fac Engn, Dept Elect & Elect Engn, Nada Ku, Kobe, Hyogo 6578501, Japan
[2] Kobe Univ, Grad Sch Sci & Technol, Nada Ku, Kobe, Hyogo 6578501, Japan
关键词
D O I
10.1063/1.1503860
中图分类号
O59 [应用物理学];
学科分类号
摘要
Photoluminescence (PL) properties and PL decay dynamics of SiO2 films containing Si nanocrystals (nc-Si) and Tm3+ were studied. The samples exhibited a broad PL at around 1.5 eV due to the recombination of excitons in nc-Si, and rather sharp PL at 1.58, 0.84, and 0.69 eV corresponding to the intra-4f shell transitions of Tm3+. The correlation between the intensities of nc-Si and Tm3+ related PL was studied as a function of the Tm concentration, the size of nc-Si, and the temperature. It was found that the intensity of Tm3+ related PL depends strongly on the size of nc-Si. At low temperatures, the spectral shape of nc-Si PL was strongly modified by doping Tm. From analysis of the modified spectral shape, a resonant energy transfer from nc-Si to Tm3+ is discussed. (C) 2002 American Institute of Physics.
引用
收藏
页码:4001 / 4006
页数:6
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