Micromachining of organic polymers by direct photo-etching using a laser plasma X-ray source

被引：29

作者：

Fiedorowic, H

Bartnik, A

Bittner, A

Juha, L

Krasa, J

Kubat, P

Mikolajczyk, J

Rakowski, R

机构：

[1] Mil Univ Technol, Inst Optoelect, PL-00908 Warsaw, Poland

[2] Inst Phys, Joint Res Lab PALS, Prague 18221 8, Czech Republic

[3] Inst Plasma Phys ASCR, Prague 18221 8, Czech Republic

[4] ASCR, Inst Phys Chem, Prague 18223, Czech Republic

来源：

MICROELECTRONIC ENGINEERING | 2004年 / 73-4卷

关键词：

microstructures; photo-etching; x-rays;

D O I：

10.1016/j.mee.2004.02.063

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

The first experiments on direct photo-etching of organic polymers using a laser plasma X-ray source based on a laser-irradiated gas puff target are presented. High-intensity nanosecond pulses of soft X-ray radiation in the wavelength range from about 1 to 8 nm. were produced by irradiation of the xenon/helium double-stream gas puff target with laser pulses from The Prague Asterix Laser System (PALS). The resulting X-ray pulses were used to irradiate samples from organic polymers and form microstructures by X-ray direct photo-etching. The results show relatively high efficiency of X-ray direct photo-etching that could be useful for micromachining of organic polymers. (C) 2004 Elsevier B.V. All rights reserved.

引用

页码：336 / 339

页数：4

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