Ablation of PMMA, PTFE, and Si by soft x-rays emitted from hot dense plasma

被引:5
作者
Juha, L [1 ]
Krása, J [1 ]
Präg, AR [1 ]
Cejnarová, A [1 ]
Chvostová, D [1 ]
Kravárik, J [1 ]
Kubes, P [1 ]
Bakshaev, YL [1 ]
Chernenko, AS [1 ]
Korolev, VD [1 ]
Tumanov, VI [1 ]
Ivanov, MI [1 ]
Scholz, M [1 ]
Ryc, L [1 ]
Tomaszewski, K [1 ]
Viskup, R [1 ]
Boody, FP [1 ]
Kodymová, J [1 ]
机构
[1] Acad Sci Czech Republ, Inst Phys, Prague 18221 8, Czech Republic
来源
HIGH-POWER LASER ABLATION IV, PTS 1 AND 2 | 2002年 / 4760卷
关键词
ablation; polymers; silicon; soft x-rays; Z-pinch; plasma focus; laser-produced plasma;
D O I
10.1117/12.482076
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
The efficiency and ablation threshold of polymethylmethacrylate (PMMA), polytetrafluoroethylene (PTFE), and monocrystalline silicon by single pulses of soft x-rays emitted from Z-pinch, plasma-focus, and laser-produced plasmas were investigated. The Z-pinch was driven by the S-300 pulsed-power machine (Kurchatov Institute, Moscow) and the plasma focus was realized in the PF-1000 machine (Institute of Plasma Physics and Laser Microfusion, Warsaw). Higher temperature plasma than with the discharge plasmas was obtained by focusing the near-infrared beam from the PALS high-power iodine laser system (Czech Academy of Sciences, Prague) on the surface of a metallic slab target. The role of nonthermal processes in x-ray ablation was evaluated. Possible ways to use x-ray ablation for micromachining are discussed.
引用
收藏
页码:1098 / 1105
页数:8
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