共 15 条
- [11] FIELD EMITTER ARRAY MASK PATTERNING USING LASER INTERFERENCE LITHOGRAPHY [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1995, 13 (05): : 1973 - 1978
- [12] FIELD-EMITTER ARRAYS FOR VACUUM MICROELECTRONICS [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1991, 38 (10) : 2355 - 2363
- [13] THE OPTICAL-PROPERTIES OF MOTH EYE ANTIREFLECTION SURFACES [J]. OPTICA ACTA, 1982, 29 (07): : 993 - 1009
- [14] Interferometric lithography exposure tool for 180-nm structures [J]. EMERGING LITHOGRAPHIC TECHNOLOGIES, 1997, 3048 : 248 - 254
- [15] HIGH ASPECT-RATIO HOLOGRAPHIC PHOTORESIST GRATINGS [J]. APPLIED OPTICS, 1988, 27 (14): : 2999 - 3002