Automated interference lithography systems for generation of sub-micron feature size patterns

被引:26
作者
Hobbs, DS [1 ]
MacLeod, BD [1 ]
Kelsey, AF [1 ]
Leclerc, MA [1 ]
Sabatino, E [1 ]
Resler, DP [1 ]
机构
[1] HLS, Bedford, MA 01730 USA
来源
MICROMACHINE TECHNOLOGY FOR DIFFRACTIVE AND HOLOGRAPHIC OPTICS | 1999年 / 3879卷
关键词
interference lithography; holographic; gratings; DFB; FED; LCD; photoresist; metrology; motheye; AR coating;
D O I
10.1117/12.360517
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Interferometric lithography is a maturing technology for patterning sub-micron structures in arrays covering large areas. The interference of two or more coherent optical waves is recorded in photoresist to produce a variety of structures including gratings, holes, posts, cones, and grids. This lithographic technique allows maskless patterning of large area substrates using short exposure times. Applications for periodic patterns include distributed feedback (DFB) lasers, field emission displays (FED), liquid crystal displays (LCD), advanced data storage applications, optical gratings, metrology standards, and motheye or sub-wavelength structures (SWS). Our work, is motivated by interest in bringing interferometric patterning out of research laboratories and into mainstream production facilities where hi,oh volume applications require automation and simplification of the exposure process. The concept and operational principles of two automated interference lithography systems, the HLS System 1000, and the HLS Model PC2, are introduced.
引用
收藏
页码:124 / 135
页数:4
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