Comparison of texture evolution in Ag and Ag(Al) alloy thin films on amorphous SiO2

被引：83

作者：

Kim, HC ^{[1
]}

Theodore, ND ^{[1
]}

Alford, TL ^{[1
]}

机构：

[1] Arizona State Univ, Dept Chem & Mat Engn, Tempe, AZ 85287 USA

来源：

JOURNAL OF APPLIED PHYSICS | 2004年 / 95卷 / 09期

关键词：

D O I：

10.1063/1.1682685

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The thermal stability of Ag metallization on SiO2 was improved by using Ag(Al) alloy films instead of pure Ag thin films which agglomerate at high temperature. X-ray diffraction techniques were used to study the texture evolution of Ag and Ag(Al) films. Different behaviors were observed in texture evolution of Ag and Ag(Al) films. Detailed information about the texture of Ag and Ag(Al) films was obtained by performing pole-figure analysis. Two different changes in texture are explained using a grain-growth mechanism and an agglomeration phenomenon, both of which work to reduce the total free energy of the system at high temperature. Based on the data obtained in this study, the texture evolution of Ag film, induced by agglomeration, and Ag(Al) film is discussed. (C) 2004 American Institute of Physics.

引用

页码：5180 / 5188

页数：9

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