Growth of Ag films on PET deposited by magnetron sputtering

被引：24

作者：

Charton, C ^{[1
]}

Fahland, M ^{[1
]}

机构：

[1] Fraunhofer Inst Elektronenstrahl & Plasmatech, D-01277 Dresden, Germany

来源：

VACUUM | 2002年 / 68卷 / 01期

关键词：

film growth; Ag; magnetron sputtering; surface diffusion;

D O I：

10.1016/S0042-207X(02)00289-0

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Thin Ag films grown under varying deposition conditions are analysed by means of SEM, AFM and XRD measurements. The films are deposited onto a Polyethylene terephthalate web by DC magnetron sputtering. The extent to which the deposition conditions influence the growth mode of the Ag films is examined. The electron micrographs clearly show that the percolation threshold as well as the film thickness at which a closed film is formed, are dependent on the Ar pressure during deposition. The influence of the Ar pressure during deposition on the film growth is discussed in terms of the amount of energy deposited into the film during the growth process and the resulting influence on surface diffusion processes. (C) 2002 Elsevier Science Ltd. All rights reserved.

引用

页码：65 / 73

页数：9

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