The permeability of plated ferrite films

被引：8

作者：

van der Zaag, PJ

Lubitz, P

Kitamoto, Y

Abe, M

机构：

[1] Philips Res Labs, NL-5656 AA Eindhoven, Netherlands

[2] USN, Res Lab, Washington, DC 20375 USA

[3] Tokyo Inst Technol, Dept Phys Elect, Tokyo 152, Japan

来源：

IEEE TRANSACTIONS ON MAGNETICS | 1999年 / 35卷 / 05期

关键词：

D O I：

10.1109/20.800549

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

The soft-magnetic properties of ferrite films deposited by ferrite plating are discussed. The crucial parameter in this respect is the initial permeability, mu(i), which is 28 +/- 3 for an as-deposited film and 60 +/- 5 for an annealed him on glass substrates. The origin of these relatively high values of mu(i) is discussed.

引用

收藏

页码：3436 / 3438

页数：3

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