Long-term laser durability testing of optical coatings and thin films for 157-nm lithography

被引：3

作者：

Liberman, V ^{[1
]}

Rothschild, M ^{[1
]}

Palmacci, ST ^{[1
]}

Efremow, NN ^{[1
]}

Sedlacek, JHC ^{[1
]}

Grenville, A ^{[1
]}

机构：

[1] MIT, Lincoln Lab, Lexington, MA 02420 USA

来源：

OPTICAL MICROLITHOGRAPHY XV, PTS 1 AND 2 | 2002年 / 4691卷

关键词：

D O I：

10.1117/12.474552

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

Long-term durability tests of optical thin films and thin films designed for attenuating phase shifters have been performed in a chamber, which stresses clean protocols to eliminate extraneous effects of surface contamination. Most anti-reflective coatings tend to degrade several percent in transmission within 1 MJ/cm(2) total dose. Attenuating phase shifting materials usually show an increase in transmission during 6 kJ/cm(2). In both types of films there are exceptions, indicating that there are no fundamental causes that would limit the performance of such films. A new phenomenon of laser-induced surface damage in calcium fluoride has been observed, and is being studied.

引用

页码：568 / 575

页数：8

共 6 条

[1] UV cleaning of contaminated 157-nm reticles [J].

Bloomstein, TM ;

Liberman, V ;

Rothschild, M ;

Efremow, NN ;

Hardy, DE ;

Palmacci, ST .

OPTICAL MICROLITHOGRAPHY XIV, PTS 1 AND 2, 2001, 4346 :669-675

[2] Controlled contamination of optics under 157-nm laser irradiation [J].

Bloomstein, TM ;

Liberman, V ;

Palmacci, ST ;

Rothschild, M .

OPTICAL MICROLITHOGRAPHY XIV, PTS 1 AND 2, 2001, 4346 :685-694

[3] OBSERVATION OF PHOTON-STIMULATED DESORPTION FOLLOWING VALENCE-BAND EXCITATION OF ALKALI-HALIDES [J].

BUNTON, PH ;

HAGLUND, RF ;

LIU, D ;

TOLK, NH .

PHYSICAL REVIEW B, 1992, 45 (09) :4566-4571

[4] Marathon evaluation of optical materials for 157-nm lithography [J].

Liberman, V ;

Rothschild, A ;

Efremow, NN ;

Palmacci, ST ;

Sedlacek, JHC ;

Van Peski, C ;

Orvek, K .

OPTICAL MICROLITHOGRAPHY XIV, PTS 1 AND 2, 2001, 4346 :45-51

[5] Long-term testing of optical components for 157-nm lithography [J].

Liberman, V ;

Rothschild, R ;

Sedlacek, JHC ;

Uttaro, RS ;

Bates, AK ;

Orvek, K .

OPTICAL MICROLITHOGRAPHY XIII, PTS 1 AND 2, 2000, 4000 :488-495

[6]

LIBERMAN V, 2002, P SPIE, V4691

← 1 →