Photoelectron microscopy and applications in surface and materials science

被引:160
作者
Günther, S
Kaulich, B
Gregoratti, L
Kiskinova, M
机构
[1] Sincrotrone Trieste, Area Sci Pk, I-34012 Basovizza Trieste, Italy
[2] Leibniz Univ Hannover, Inst Phys Chem & Elektrochem, D-30167 Hannover, Germany
关键词
photoelectron microscopy; spectromicroscopy; scanning photoelectron microscopy; photoelectron emission microscopy; photoemission; X-ray photoelectron spectroscopy; X-ray absorption spectroscopy; X-ray absorption near edge structure; surface science; materials science; semiconductors; reactions;
D O I
10.1016/S0079-6816(02)00007-2
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
We review the recent achievements of photoelectron microscopy (PEM), which is a rapidly developing technique that is significantly advancing the frontiers of surface and materials science. The operation principles of scanning photoelectron microscopes (SPEM), using different photon optic systems to obtain a micro-probe of sub-micrometer dimensions, and of the full-field imaging microscope, using electrostatic lenses for magnification of the irradiated sample area, are presented. The contrast mechanisms, based on photon absorption and photon-induced electron emission, are described and the expected development in the photon and electron optics and detection systems are discussed. Particular attention is paid to the present state-of-art performance of the microscopes collecting photoelectrons (PEs), which carry specific information about the lateral variations in the chemical, magnetic and electronic properties of the material under investigation. Selected results, obtained recently with instruments installed at synchrotron light facilities, are used to illustrate the potential of PEM in characterising micro-phases and dynamic processes with a lateral resolution better than 100 nm. (C) 2002 Elsevier Science Ltd. All rights reserved.
引用
收藏
页码:187 / 260
页数:74
相关论文
共 254 条
  • [1] X-ray spectromicroscopy of polymers and tribological surfaces at beamline X1A at the NSLS
    Ade, H
    Smith, AP
    Zhang, H
    Zhuang, GR
    Kirz, J
    Rightor, E
    Hitchcock, A
    [J]. JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA, 1997, 84 (1-3) : 53 - 71
  • [2] Bulk and surface characterization of a dewetting thin film polymer bilayer
    Ade, H
    Winesett, DA
    Smith, AP
    Anders, S
    Stammler, T
    Heske, C
    Slep, D
    Rafailovich, MH
    Sokolov, J
    Stöhr, J
    [J]. APPLIED PHYSICS LETTERS, 1998, 73 (25) : 3775 - 3777
  • [3] A free electron laser-photoemission electron microscope system (FEL-PEEM)
    Ade, H
    Yang, W
    English, SL
    Hartman, J
    Davis, RF
    Nemanich, RJ
    Litvinenko, VN
    Pinayev, IV
    Wu, Y
    Madey, JMJ
    [J]. SURFACE REVIEW AND LETTERS, 1998, 5 (06) : 1257 - 1268
  • [4] X-RAY MICROSCOPY IN POLYMER SCIENCE - PROSPECTS OF A NEW IMAGING TECHNIQUE
    ADE, H
    SMITH, AP
    CAMERON, S
    CIESLINSKI, R
    MITCHELL, G
    HSIAO, B
    RIGHTOR, E
    [J]. POLYMER, 1995, 36 (09) : 1843 - 1848
  • [5] IMAGES OF A MICROELECTRONIC DEVICE WITH THE X1-SPEM, A 1ST GENERATION SCANNING PHOTOEMISSION MICROSCOPE AT THE NATIONAL SYNCHROTRON LIGHT-SOURCE
    ADE, H
    KIRZ, J
    HULBERT, S
    JOHNSON, E
    ANDERSON, E
    KERN, D
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1991, 9 (03): : 1902 - 1906
  • [6] Ade H, 2000, INST PHYS CONF SER, P109
  • [7] ESCASCOPE - A NEW IMAGING PHOTOELECTRON SPECTROMETER
    ADEM, E
    CHAMPANERIA, R
    COXON, P
    [J]. VACUUM, 1990, 41 (7-9) : 1695 - 1699
  • [8] Multi-hit detector system for complete momentum balance in spectroscopy in molecular fragmentation processes
    Ali, I
    Dörner, R
    Jagutzki, O
    Nüttgens, S
    Mergel, V
    Spielberger, L
    Khayyat, K
    Vogt, T
    Bräuning, H
    Ullmann, K
    Moshammer, R
    Ullrich, J
    Hagmann, S
    Groeneveld, KO
    Cocke, CL
    Schmidt-Böcking, H
    [J]. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1999, 149 (04) : 490 - 500
  • [9] Study of tribochemical processes on hard disks using photoemission electron microscopy
    Anders, S
    Stammler, T
    Fong, W
    Chen, CY
    Bogy, DB
    Bhatia, CS
    Stöhr, J
    [J]. JOURNAL OF TRIBOLOGY-TRANSACTIONS OF THE ASME, 1999, 121 (04): : 961 - 967
  • [10] Photoemission electron microscope for the study of magnetic materials
    Anders, S
    Padmore, HA
    Duarte, RM
    Renner, T
    Stammler, T
    Scholl, A
    Scheinfein, MR
    Stöhr, J
    Séve, L
    Sinkovic, B
    [J]. REVIEW OF SCIENTIFIC INSTRUMENTS, 1999, 70 (10) : 3973 - 3981