Relief gratings on Er/Yb-doped borosilicate glasses and waveguides by excimer laser ablation

被引：13

作者：

Pissadakis, S ^{[1
]}

Reekie, L ^{[1
]}

Hempstead, M ^{[1
]}

Zervas, MN ^{[1
]}

Wilkinson, JS ^{[1
]}

机构：

[1] Univ Southampton, Optoelect Res Ctr, Southampton SO17 1BJ, Hants, England

来源：

APPLIED SURFACE SCIENCE | 2000年 / 153卷 / 04期

基金：

英国工程与自然科学研究理事会;

关键词：

laser ablation; micromachining; gratings; optical waveguides;

D O I：

10.1016/S0169-4332(99)00365-7

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Relief gratings have been fabricated on Er/Yb-doped borosilicate glass substrates by laser ablation using a 193 nm excimer laser and a modified Mach-Zehnder interferometer. The grating fabrication process was quantified using diffraction efficiency measurements and related to the incident energy density. Diffraction efficiencies and grating profiles are presented for gratings fabricated using different pulse energy densities and number of pulses, and optimised fabrication conditions are proposed. Finally, relief gratings were applied to ion-exchanged channel waveguides and spectral transmission measurements are presented. (C) 2000 Elsevier Science B.V. All rights reserved.

引用

页码：200 / 210

页数：11

共 21 条

[1] 100-PERCENT REFLECTIVITY BRAGG REFLECTORS PRODUCED IN OPTICAL FIBERS BY SINGLE EXCIMER-LASER PULSES [J].

ARCHAMBAULT, JL ;

REEKIE, L ;

RUSSELL, PSJ .

ELECTRONICS LETTERS, 1993, 29 (05) :453-455

[2] CONTROLLED ETCHING OF SILICATE-GLASSES BY PULSED ULTRAVIOLET-LASER RADIATION [J].

BRAREN, B ;

SRINIVASAN, R .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1988, 6 (02) :537-541

[3] GLASS-SURFACE TREATMENT WITH EXCIMER AND CO2-LASERS [J].

BUERHOP, C ;

BLUMENTHAL, B ;

WEISSMANN, R ;

LUTZ, N ;

BIERMANN, S .

APPLIED SURFACE SCIENCE, 1990, 46 (1-4) :430-434

[4] Ion-exchanged planar lossless splitter at 1.5 mu m [J].

Camy, P ;

Roman, JE ;

Willems, FW ;

Hempstead, M ;

vanderPlaats, JC ;

Prel, C ;

Beguin, A ;

Koonen, AMJ ;

Wilkinson, JS ;

Lerminiaux, C .

ELECTRONICS LETTERS, 1996, 32 (04) :321-323

[5] LASER-PHOTOETCHING CHARACTERISTICS OF POLYMERS WITH DOPANTS [J].

CHUANG, TJ ;

HIRAOKA, H ;

MODL, A .

APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1988, 45 (04) :277-288

[6] Analysis and application of a 0/1 order Talbot interferometer for 193 nm laser grating formation [J].

Dyer, PE ;

Farley, RJ ;

Giedl, R .

OPTICS COMMUNICATIONS, 1996, 129 (1-2) :98-108

[7] Excimer laser ablation of polymers and glasses for grating fabrication [J].

Dyer, PE ;

Farley, RJ ;

Giedl, R ;

Karnakis, DM .

APPLIED SURFACE SCIENCE, 1996, 96-8 :537-549

[8] INFLUENCE OF THE BEAM SPOT SIZE ON ABLATION RATES IN PULSED-LASER PROCESSING [J].

EYETT, M ;

BAUERLE, D .

APPLIED PHYSICS LETTERS, 1987, 51 (24) :2054-2055

[9] DIRECT FORMATION OF GRATING STRUCTURES ON SILICON USING KRF LASER-RADIATION [J].

FEDOSEJEVS, R ;

BRETT, MJ .

APPLIED OPTICS, 1989, 28 (10) :1877-1880

[10] High-index overlay for high reflectance DBR gratings in LiNbO3 channel waveguides [J].

Hussell, CP ;

Ramaswamy, RV .

IEEE PHOTONICS TECHNOLOGY LETTERS, 1997, 9 (05) :636-638

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