Influence of band structure on electron ballistic transport in silicon nanowire MOSFET's: An atomistic study

被引:84
作者
Nehari, K
Cavassilas, N
Autran, JL
Bescond, M
Munteanu, D
Lannoo, M
机构
[1] CNRS, UMR 6137, L2MP, F-13384 Marseille 13, France
[2] ENSPG, IMEP, F-38016 Grenoble, France
关键词
ballistic transport; tight-binding; Green's function formalism; band structure; atomic modeling; quantum tunneling; silicon nanowire;
D O I
10.1016/j.sse.2006.03.041
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This work investigates the conduction band structure of silicon nanowires, its dependence with the wire width and its influences on the electrical performances of Si nanowire-based MOSFET's working in the ballistic regime. The energy dispersions relations for Si nanowires have been calculated using a sp(3) tight-binding model and the ballistic response of n-channel devices with a 3D Poisson-Schrodinger solver considering a mode-space approach and open boundary conditions (NEGF formalism). Results are compared with data obtained considering the parabolic bulk effective mass approximation, highlighting in this last case the overestimation of the I-on current, up to 60% for the smallest (1.36 nm x 1.36 nm Si wire) devices. (c) 2006 Elsevier Ltd. All rights reserved.
引用
收藏
页码:716 / 721
页数:6
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